Published 2005
| Version v1
Book
Fluence dependence of secondary electron emission yield from Bi target
- 1. Department of Physics, Government Model Science College, Gwalior (India)
- 2. Department of Physics, R.B.S. College, Agra (India)
- 3. Nuclear Science Centre, New Delhi (India)
Description
We have measured the forward yield, backward yield, and total yield from thin target of bismuth bombarded by silver ion beam of energy 59 MeV. It has been found that initially these yields decrease exponentially with the increasing fluence and then becomes saturated after a particular value of fluence. Various physical causes responsible for the variation in yield are discussed qualitatively. (author)
Additional details
Publishing Information
- Publisher
- Allied Publishers Private Ltd.
- Imprint Place
- New Delhi (India)
- ISBN
- 81-7764-652-4
- Imprint Title
- Proceedings of the DAE solid state physics symposium. V. 46
- Imprint Pagination
- 1053 p.
- Journal Page Range
- p. 377-378
Conference
- Title
- 46. DAE solid state physics symposium
- Dates
- 26-30 Dec 2003
- Place
- Gwalior (India)
INIS
- Country of Publication
- India
- Country of Input or Organization
- India
- INIS RN
- 37018938
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BISMUTH; ELECTRON EMISSION; FARADAY CUPS; INELASTIC SCATTERING; IRRADIATION; MEV RANGE 10-100; PHYSICAL RADIATION EFFECTS; SILVER IONS; THIN FILMS
- Descriptors DEC
- BEAM MONITORS; CHARGED PARTICLES; ELEMENTS; EMISSION; ENERGY RANGE; FILMS; IONS; MEASURING INSTRUMENTS; METALS; MEV RANGE; MONITORS; RADIATION EFFECTS; SCATTERING
Optional Information
- Notes
- 11 refs., 2 figs.