Published July 1991 | Version v1
Journal article

Evaluation of thin films fabricated by low energy direct ion beam deposition for soft X-rays

  • 1. Central Research Lab., Japan Aviation Electronics Industry Ltd., Tokyo (Japan)
  • 2. Univ. Louis Pasteur, Ecole Nationale Superieure de Physique de Strasbourg, 67 (France)

Description

The amorphous structure and the surface roughness of carbon films fabricated by low energy direct ion beam deposition were evaluated as a function of ion energy. The amorphous structure was evaluated by the ordering factor, which was defined as a root-mean-square value of the correlation function of the RHEED pattern. The surface roughness was measured using STM and a stylus surface profiler. The ordering factor and surface roughness drastically changed as ion energy was increased from 20 to 140 eV. From this experiment, we found that carbon films fabricated at 100 eV have the smallest ordering factor and the smallest surface roughness. (orig.)

Additional details

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research, Section B
Journal Volume
59/60
Journal Issue
pt.1
Series
Nucl. Instrum. Methods Phys. Res., Sect. B.
Journal Page Range
321-325
ISSN
0168-583X
CODEN
NIMBE

Conference

Title
7. international conference on ion beam modification of materials (IBMM-7) and exposition.
Dates
9-14 Sep 1990.
Place
Knoxville, TN (United States).

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
23000357
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AMORPHOUS STATE; CARBON; CORRELATION FUNCTIONS; DEPOSITION; ENERGY DEPOSITION; EV RANGE 10-100; EV RANGE 100-1000; FABRICATION; FILMS; ION BEAMS; ROUGHNESS; THIN FILMS
Descriptors DEC
BEAMS; ELEMENTS; ENERGY RANGE; EV RANGE; FUNCTIONS; NONMETALS; SURFACE PROPERTIES