The different behavior of nitrogen and phosphorus as n-type dopants in SiC
Creators
Description
In this work, the experimentally observed differences in the behavior of nitrogen and phosphorus as n-type dopants in silicon carbide have been investigated within the framework of density functional theory. A key to the understanding of complex formation is the investigation of the dynamics of these dopant atoms. We have found essential differences in the recombination behavior of nitrogen and phosphorus atoms with vacancies. In contrast to nitrogen, which prefers to be built in on the carbon site exclusively (NC), our dynamical calculations show phosphorus to be built in on both substitutional lattice sites (PSi and PC). By this, PC-containing complexes should be considered as possible candidates for P-related electron paramagnetic resonance spectra in 6H-SiC which up to now have not been explained consistently. Furthermore, we explain why the formation of inactive complexes is likely in case of nitrogen but not in case of phosphorus
Additional details
Identifiers
- DOI
- 10.1016/j.physb.2003.09.234;
- PII
- S0921452603006677;
Publishing Information
- Journal Title
- Physica. B, Condensed Matter
- Journal Volume
- 340-342
- Journal Issue
- 3-4
- Journal Page Range
- p. 184-189
- ISSN
- 0921-4526
- CODEN
- PHYBE3
Conference
- Title
- 22. international conference on defects in semiconductors
- Dates
- 28 Jul - 1 Aug 2003
- Place
- Aarhus (Denmark)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36112828
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTRA; ANNEALING; ATOMS; CARBON; DENSITY FUNCTIONAL METHOD; DOPED MATERIALS; ELECTRON SPIN RESONANCE; HYDROGEN; N-TYPE CONDUCTORS; NITROGEN; PHOSPHORUS; RECOMBINATION; SILICON CARBIDES; VACANCIES
- Descriptors DEC
- CALCULATION METHODS; CARBIDES; CARBON COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; HEAT TREATMENTS; MAGNETIC RESONANCE; MATERIALS; NONMETALS; POINT DEFECTS; RESONANCE; SEMICONDUCTOR MATERIALS; SILICON COMPOUNDS; SPECTRA; VARIATIONAL METHODS
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.