Published September 2005 | Version v1
Journal article

Crack-free, thick rhodium deposition on copper substrate using Rhodex solution

  • 1. Amir-Kabir Univ., Tehran (Iran, Islamic Republic of). Faculty of Physics
  • 2. Nuclear Research Center for Agriculture and Medicine (NRCAM). Karaj (Iran, Islamic Republic of). Cyclotron Dept.

Description

Rhodium electrodeposition on a copper substrate was investigated for 103Pd production. The electrodeposition was carried out by the commercially available Rhodex plating baths. The optimum conditions of the electrodeposition for complete depletion of Rh were: 6.2 g/l rhodium, DC current density of 12.83 mA x cm-2 and 60 deg C temperature. (author)

Additional details

Publishing Information

Journal Title
Journal of Radioanalytical and Nuclear Chemistry
Journal Volume
265
Journal Issue
3
Journal Page Range
p. 455-458
ISSN
0236-5731
CODEN
JRNCDM

Optional Information

Notes
17 refs.