Published October 1977
| Version v1
Journal article
Secondary ion mass spectroscopy
Creators
- 1. Ustav Radiotechniky a Elektroniky CSAV, Prague (Czechoslovakia)
Description
Secondary ion mass spectroscopy is one of the modern methods suitable for the analysis of thin films and solid state surfaces. The method is capable of providing the compositional information with a depth resolution below 0.1 μm and a sensitivity of the order of 10-3 ppm for some impurities. The review article contains a description of the method, a list of typical applications and a short account of relevant theories. (author)
Additional details
Additional titles
- Original title (Czech)
- Hmotova spektroskopie sekundarnich iontu (SIMS)
Publishing Information
- Journal Title
- Cesk. Cas. Fys.
- Journal Volume
- 27
- Journal Issue
- 5
- Series
- Cesk. Cas. Fys.
- Journal Page Range
- 451-459
INIS
- Country of Publication
- Serbia and Montenegro
- Country of Input or Organization
- Serbia and Montenegro
- INIS RN
- 9405317
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ION SPECTROSCOPY; IONIZATION; MASS SPECTROSCOPY; QUANTITATIVE CHEMICAL ANALYSIS; SECONDARY BEAMS; SECONDARY EMISSION; SENSITIVITY; SURFACES; USES
- Descriptors DEC
- BEAMS; CHEMICAL ANALYSIS; EMISSION; PARTICLE BEAMS; SPECTROSCOPY