Plasma measurement of electron cyclotron resonance ion source for new materials production

An electron cyclotron resonance ion source (ECRIS) has been designed and developed for a synthesis of new materials such as endohedral metallofullerenes. The plasma chamber diameter is 140 mm in order to produce large m/q ions, like singly charged C60 ions effectively. In this study, we examined the performance of our ECRIS by plasma measurements using a Langmuir probe. The plasma density increased with increasing Ar pressure and reached to 6.1x1017 m-3 at a pressure of 5.0x10-3 Pa. The plasma was produced over a large volume compared with conventional ECRISs. (author)