Published April 2016 | Version v1
Journal article

Tuning plasmon resonance in depth-variant plasmonic nanostructures

  • 1. College of Information Science and Engineering, Northeastern University, Shenyang 110004 (China)
  • 2. Institute of Materials Research and Engineering, Agency for Science, Technology and Research - A*STAR, 2 Fusionopolis Way, 08-03, Innovis, Singapore 138634 (Singapore)

Description

Highlights: • We show plasmonic nanostructures for tunable plasmon resonances in optically thick metal films. • Precise domination on etching depth is realized via cross-section investigation using scanning electron microscopy. • The approach developed in this work is useful for optical devices design and development in imaging and display applications. We demonstrate coaxial-aperture-based plasmonic nanostructures for tunable plasmon resonances in optically thick metal films. Accurate control of etching depth is achieved via cross-section investigation under a scanning electron microscope. Colorful surfaces are observed with varying geometries. The approach developed in this work is potentially useful for optical devices design and development in nanophotonics and integrated optics, especially for imaging and display applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matdes.2016.02.005

Additional details

Identifiers

DOI
10.1016/j.matdes.2016.02.005;
PII
S0264127516301526;

Publishing Information

Journal Title
Materials and Design
Journal Volume
96
Journal Page Range
p. 64-67
ISSN
0264-1275

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51121729
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY; S36: MATERIALS SCIENCE; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
CROSS SECTIONS; ION BEAMS; NANOSTRUCTURES; OPTICS; PLASMONS; RESONANCE; SCANNING ELECTRON MICROSCOPY
Descriptors DEC
BEAMS; ELECTRON MICROSCOPY; MICROSCOPY; QUASI PARTICLES

Optional Information

Copyright
Copyright (c) 2016 Elsevier Ltd. All rights reserved.