Tuning plasmon resonance in depth-variant plasmonic nanostructures
- 1. College of Information Science and Engineering, Northeastern University, Shenyang 110004 (China)
- 2. Institute of Materials Research and Engineering, Agency for Science, Technology and Research - A*STAR, 2 Fusionopolis Way, 08-03, Innovis, Singapore 138634 (Singapore)
Description
Highlights: • We show plasmonic nanostructures for tunable plasmon resonances in optically thick metal films. • Precise domination on etching depth is realized via cross-section investigation using scanning electron microscopy. • The approach developed in this work is useful for optical devices design and development in imaging and display applications. We demonstrate coaxial-aperture-based plasmonic nanostructures for tunable plasmon resonances in optically thick metal films. Accurate control of etching depth is achieved via cross-section investigation under a scanning electron microscope. Colorful surfaces are observed with varying geometries. The approach developed in this work is potentially useful for optical devices design and development in nanophotonics and integrated optics, especially for imaging and display applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matdes.2016.02.005Additional details
Identifiers
- DOI
- 10.1016/j.matdes.2016.02.005;
- PII
- S0264127516301526;
Publishing Information
- Journal Title
- Materials and Design
- Journal Volume
- 96
- Journal Page Range
- p. 64-67
- ISSN
- 0264-1275
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51121729
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S36: MATERIALS SCIENCE; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- CROSS SECTIONS; ION BEAMS; NANOSTRUCTURES; OPTICS; PLASMONS; RESONANCE; SCANNING ELECTRON MICROSCOPY
- Descriptors DEC
- BEAMS; ELECTRON MICROSCOPY; MICROSCOPY; QUASI PARTICLES
Optional Information
- Copyright
- Copyright (c) 2016 Elsevier Ltd. All rights reserved.