Semi-transparent X-UV multilayer: theoretical analysis, characterisation and applications

This work presents a study of semi-transparent X-UV multilayers. These were fabricated by local destruction of a substrate or by multilayer deposition on a low absorbance thin film. From these multilayers an X-Ray beamsplitter can be made which has a good transmission coefficient and a large relection coefficient. The compromise between transmittance and reflectance can be optimized by choosing adequate parameters for both the multilayer and the substrate. This can be done using calculation methods developed for X-UV interferential mirrors. An experimental apparatus called multilayers bichromator was then developed. It is based on the semi-transparent multilayer properties. This made possible the study of the time shift between two neon plasma emission lines in the one KeV range