Published 1990 | Version v1
Book

Effect of hydrogen plasma treatment on SnO2:F films for use in a-Si solar cells

  • 1. Advanced Glass R and D Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221 (Japan)

Description

This paper reports the effects of hydrogen plasma treatment on the properties of SnO2:F films investigated using x-ray photoelectron spectroscopy (XPS). It was found that silicon oxide formed at the interface between SnO2:F and a-Si:H was decreased by the pretreatment t temperatures above 150 degrees C for highly transparent films with low carrier concentration. The decrease of silicon oxide was closely correlated to the decrease in resistivity corresponding to the increase in Hall mobility of SnO2:F surface is a dominant effect of the pretreatment. The a-Si solar cell fabricated on the pretreated SnO2:F film showed improved fill-factor and conversion efficiency, which could be explained by the lowered sheet resistance and the improved SnO2:F/a-Si:H interface

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
Twenty first IEEE photovoltaic specialists conference 1990 (Conference Record)
Imprint Pagination
1673 p.
Journal Page Range
p. 1584-1587.

Conference

Title
21. Institute for Electrical and Electronics Engineers (IEEE) photovoltaic specialists conference.
Dates
21-25 May 1990.
Place
Kissimmee, FL (USA).

Optional Information

Secondary number(s)
CONF-900542--.