Published March 2008
| Version v1
Report
Plasma control for efficient extreme ultra-violet source
Creators
- 1. Tokyo Institute of Technology, Interdisciplinary Graduate School of Science and Engineering, Yokohama, Kanagawa (Japan)
Description
To generate a high efficiency extreme-ultraviolet (EUV) source, effects of plasma shape for controlling radiative plasmas based on xenon capillary discharge are experimentally investigated. The radiation characteristics observed via tapered capillary discharge are compared with those of straight one. From the comparison, the long emission period and different plasma behaviors of tapered capillary discharge are confirmed. This means that control of the plasma geometry is effective for prolonging the EUV emission period. This result also indicates that the plasma shape control seems to have a potential for enhancing the conversion efficiency. (author)
Additional details
Publishing Information
- Imprint Title
- Frontiers in pulse-power-based high energy density plasma physics and its applications
- Imprint Pagination
- 110 p.
- Journal Page Range
- p. 5-9
- Report number
- NIFS-PROC--72
Conference
- Title
- Symposium on frontiers in pulse-power-based high energy density physics
- Dates
- 5-6 Mar 2007
- Place
- Toki, Gifu (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 40104417
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CONVERSION; EFFICIENCY; ELECTRIC DISCHARGES; EXTREME ULTRAVIOLET RADIATION; EXTREME ULTRAVIOLET SPECTRA; GEOMETRY; LONGITUDINAL PINCH; PHOTODIODES; PLASMA; PLASMA DIAGNOSTICS; RADIATION SOURCES; SHAPE; XENON
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; MATHEMATICS; NONMETALS; PINCH EFFECT; RADIATIONS; RARE GASES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SPECTRA; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTRA
Optional Information
- Notes
- 14 refs., 10 figs.