Published March 1987 | Version v1
Journal article

Refractory-Metal silicide formation with E-Beam and laser pulses

  • 1. Lecce Univ., (Italy)
  • 2. Modena Univ. (Italy)

Description

Thin films of refractory metals (Mo, Ti) have been deposited on different substrates and irradiated by pulses of electron beams (25 keV-50ns) and laser beams (Nd: verre-30ns). All the samples react with radiation intensities dependent of the substrate type. Experimental results have been analyzed with Rutherford backscattering spectroscopy of irradiated samples together with profile and evolution of temperature after annealing

Additional details

Publishing Information

Journal Title
Vide. Couches Minces
Journal Volume
42
Journal Issue
236
Series
Vide. Couches Minces.
Journal Page Range
67-69
ISSN
0042-5281
CODEN
VIDEA

Conference

Title
European colloquium on refractory metals and silicon.
Dates
24-26 Mar 1987.
Place
Aussois (France).