Ion bombardment of gallium thin films
Description
In this letter we describe bombardment and annealing experiments carried out independently on gallium. Systems such as gallium which show metastable phase formation during static or dynamic undercooling might also be expected to form metastable phases during ion bombardment. Bombardment experiments were carried out using gallium or argon ions produced on a 100 kV heavy-ion accelerator. Gallium samples were evaporated in situ from alumina boats onto sapphire (for electrical measurements) and thin-film carbon (for electron diffraction) substrates during the same evaporation. After deposition, both samples were bombarded in turn at 13 K with the same ion dose. Electron diffraction, 4-probe a.c., and 2-probe d.c. electrical measurements were used to monitor the effects of bombardment and annealing. Experimental details are given. Results are given and discussed. (author)
Additional details
Publishing Information
- Journal Title
- J. Mater. Sci. Lett.
- Journal Volume
- 4
- Journal Issue
- 3
- Series
- J. Mater. Sci. Lett.
- Journal Page Range
- 273-276
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 16053437
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ARGON IONS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON DIFFRACTION; EVAPORATION; FILMS; GALLIUM; GALLIUM IONS; ORDER-DISORDER TRANSFORMATIONS; PHYSICAL RADIATION EFFECTS; STABILITY; SUBSTRATES
- Descriptors DEC
- ATOMIC IONS; CHARGED PARTICLES; CHEMICAL COATING; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTRICAL PROPERTIES; ELEMENTS; HEAT TREATMENTS; IONS; METALS; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; RADIATION EFFECTS; SCATTERING; SURFACE COATING