Published April 2007
| Version v1
Journal article
Indentation size effect in ITO/Si planar structure under concentrated load action
Creators
- 1. Inst. of applied physics, Academy of sciences of Moldova, Chisinau (Moldova, Republic of)
Description
For studying strength properties of planar structures ITO (In2O3·SnO2)/Si the technique of Vickers pyramid microindentation for the load range of 0.2-1.5 N was applied. Measurements of microhardness of these structures have shown results varying over a wide range in dependence on film thickness and applied load, this can be explained by the size effect presence. In addition to well known factors causing the size effect, another explanation being characteristic of film structures is proposed. (author)
Availability note (English)
Available online at http://sfm.asm.md/moldphys/Additional details
Identifiers
Publishing Information
- Journal Title
- Moldavian Journal of the Physical Sciences
- Journal Volume
- 6
- Journal Issue
- 2
- Journal Page Range
- p. 228-232
- ISSN
- 1810-648X
INIS
- Country of Publication
- Moldova, Republic of
- Country of Input or Organization
- Moldova, Republic of
- INIS RN
- 40072106
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DEPOSITION; FILMS; INDIUM COMPOUNDS; INDIUM OXIDES; LAYERS; MECHANICAL PROPERTIES; MICROANALYSIS; MICROHARDNESS; OXYGEN COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SILICON; TEMPERATURE RANGE 0065-0273 K; TIN COMPOUNDS; TIN OXIDES; VICKERS HARDNESS
- Descriptors DEC
- CHALCOGENIDES; ELECTRON MICROSCOPY; ELEMENTS; HARDNESS; INDIUM COMPOUNDS; MECHANICAL PROPERTIES; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; TEMPERATURE RANGE; TIN COMPOUNDS
Optional Information
- Notes
- 4 refs., 1 tab., 3 figs.