Published July 1992
| Version v1
Journal article
Structure study of nanometer-size crystalline Ti films
Creators
- 1. Suzhou Univ. (China). Dept. of Physics
- 2. Academia Sinica, Hefei (China). Inst. of Plasma Physics
Description
The nanometer-size crystalline Ti film have been manufactured by using of a sputtering deposition utilising Electron Cyclotron Resonance (ECR) plasma at room temperature. The substrates are quartz glass, NaCl monocrystal and pure Al. Thee structure and the composition of the Ti films have been determined by using XRD, TEM, XPS. The results show that the size d < 10 nm, and with a stable abnormal fcc structure. The influence of working parameters on the crystal structure, the grain size, deposition rate and adhesion of the films have been studied systematically. The mechanism of depositing Ti films have been discussed
Additional details
Publishing Information
- Journal Title
- Acta Physica Sinica
- Journal Volume
- 41
- Journal Issue
- 7
- Journal Page Range
- p. 1132-1136.
- ISSN
- 1000-3290
- CODEN
- WLHPAR
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 24073869
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADHESION; CRYSTAL STRUCTURE; DEPOSITION; ELECTRON CYCLOTRON-RESONANCE; GRAIN SIZE; PLASMA; SPUTTERING; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCO; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
- Descriptors DEC
- COHERENT SCATTERING; CYCLOTRON RESONANCE; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; FILMS; METALS; MICROSCOPY; MICROSTRUCTURE; RESONANCE; SCATTERING; SIZE; SPECTROSCOPY; TRANSITION ELEMENTS