Published September 2013
| Version v1
Journal article
Plasma Density Influence on the Properties of a Plasma Filled Rod Pinch Diode
- 1. State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024 (China)
Description
The rod pinch diode is perfect as a source of accelerators for flash X-ray radiography by virtue of a small and stable spot. But it is not suitable for intensive current drivers because of high diode impendence of 40∼60 Ω. However, by employing pre-filled plasma into diode prior to the driving current, the diode impendence can be effectively reduced. Plasma density plays an important role in this process, especially for sheath formation and space charge current in the diode. Analysis and simulation results show that a proper range of plasma density could be 1015∼1016 cm−3
Availability note (English)
Available from http://dx.doi.org/10.1088/1009-0630/15/9/14Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 15
- Journal Issue
- 9
- Journal Page Range
- p. 904-907
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46006858
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ACCELERATORS; CURRENTS; PLASMA DENSITY; SIMULATION; SPACE CHARGE; X-RAY RADIOGRAPHY
- Descriptors DEC
- INDUSTRIAL RADIOGRAPHY; MATERIALS TESTING; NONDESTRUCTIVE TESTING; TESTING