Published September 2013 | Version v1
Journal article

Plasma Density Influence on the Properties of a Plasma Filled Rod Pinch Diode

  • 1. State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024 (China)

Description

The rod pinch diode is perfect as a source of accelerators for flash X-ray radiography by virtue of a small and stable spot. But it is not suitable for intensive current drivers because of high diode impendence of 40∼60 Ω. However, by employing pre-filled plasma into diode prior to the driving current, the diode impendence can be effectively reduced. Plasma density plays an important role in this process, especially for sheath formation and space charge current in the diode. Analysis and simulation results show that a proper range of plasma density could be 1015∼1016 cm−3

Availability note (English)

Available from http://dx.doi.org/10.1088/1009-0630/15/9/14

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Science and Technology
Journal Volume
15
Journal Issue
9
Journal Page Range
p. 904-907
ISSN
1009-0630

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46006858
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ACCELERATORS; CURRENTS; PLASMA DENSITY; SIMULATION; SPACE CHARGE; X-RAY RADIOGRAPHY
Descriptors DEC
INDUSTRIAL RADIOGRAPHY; MATERIALS TESTING; NONDESTRUCTIVE TESTING; TESTING