Published August 18, 2008
| Version v1
Journal article
Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
- 1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)
- 2. Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB (United Kingdom)
Description
Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states
Additional details
Identifiers
- DOI
- 10.1063/1.2973179;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 93
- Journal Issue
- 7
- Journal Page Range
- p. 071504-071504.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40006788
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CATIONS; ELECTRON EMISSION; ELECTRONS; LINE BROADENING; MAGNETRONS; MASS; MASS SPECTROSCOPY; PLASMA; PLASMA DIAGNOSTICS; POTENTIAL ENERGY; PULSES; SPUTTERING; TITANIUM; TITANIUM IONS; WALL EFFECTS
- Descriptors DEC
- CHARGED PARTICLES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTARY PARTICLES; ELEMENTS; EMISSION; ENERGY; EQUIPMENT; FERMIONS; IONS; LEPTONS; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SPECTROSCOPY; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2008 American Institute of Physics