Published November 3, 2008 | Version v1
Journal article

Homo and hetero epitaxy of Germanium using isobutylgermane

  • 1. CNR-IMEM Institute, Parco Area delle Scienze 37/A, 43010 Fontanini, Parma (Italy)
  • 2. CESI Ricerca S.P.A., Via Rubattino 54, 20134 Milano (Italy)

Description

Nominally undoped Ge epitaxial layers were deposited on Ge and GaAs substrates by means of Metal-Organic Vapor Phase (MOVPE) using a novel Germanium source, isobutylgermane (iBuGe), by Rohm and Haas Electronic Materials LLC (USA). High Resolution X-ray Diffraction, Atomic Force Microscopy and Raman spectroscopy were combined to characterize the layers. Ge layers were deposited using AsH3 as a surfactant and several growth procedures were tested. The use of arsine reduced the growth rate and also significantly improved the epitaxial quality and surface roughness

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2008.08.137

Additional details

Identifiers

DOI
10.1016/j.tsf.2008.08.137;
PII
S0040-6090(08)00897-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
517
Journal Issue
1
Journal Page Range
p. 404-406
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
5. International conference on silicon epitaxy and heterostructures
Acronym
ICSI-5
Dates
20-24 May 2007
Place
Marseille (France)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40059035
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARSENIC HYDRIDES; ATOMIC FORCE MICROSCOPY; EPITAXY; GALLIUM ARSENIDES; GERMANIUM; LAYERS; ORGANOMETALLIC COMPOUNDS; RAMAN SPECTROSCOPY; SURFACES; X-RAY DIFFRACTION
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; ELEMENTS; GALLIUM COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; LASER SPECTROSCOPY; METALS; MICROSCOPY; ORGANIC COMPOUNDS; PNICTIDES; SCATTERING; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.