Published December 5, 2006 | Version v1
Journal article

Fabrication and characterization of photoluminescent Mn-doped-Zn2SiO4 films deposited on silicon by pulsed laser deposition

  • 1. State Key Laboratory for Silicon Materials, CMSCE, Zhejiang University, Hangzhou 310027 (China)

Description

Manganese-doped zinc silicate photoluminescent films were prepared on silicon wafer using pulsed laser deposition technique. The effects of heat treatment on the optical and structural properties were investigated by means of X-ray diffraction (XRD), Fourier-transform infrared spectroscopy (FTIR), and photoluminescence (PL) spectra. It was found in XRD patterns and FTIR that crystalline zinc silicate was formed on the silicon wafer when the annealing temperature was above 700 deg. C. The PL spectra showed that the peak wavelength of the green emission was at 525 nm with a decay time of 12.5 ms

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.07.021;
PII
S0040-6090(06)00819-4;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
4
Journal Page Range
p. 1877-1880
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.