Published January 15, 2009
| Version v1
Journal article
Image contrast enhancement in field-emission scanning electron microscopy of single-walled carbon nanotubes
- 1. Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68588-0511 (United States)
- 2. Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, NE 68588-0111 (United States)
Description
The image contrast enhancement in scanning electron microscopy of single-walled carbon nanotubes (SWNTs) on SiO2 surfaces was experimentally investigated using a field-emission scanning electron microscope (FESEM) using a wide range of primary electron (PE) voltages. SWNT images of different contrasts were obtained at different PE voltages. Image contrast enhancement of SWNTs was investigated by charging SiO2 surfaces at different PE voltages. The phenomena are ascribed to the surface potential difference and charge injection between SWNTs and SiO2 substrates induced by the electron-beam irradiation.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2008.11.035Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2008.11.035;
- PII
- S0169-4332(08)02395-7;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 255
- Journal Issue
- 7
- Journal Page Range
- p. 4341-4346
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41009371
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CARBON; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRONS; FIELD EMISSION; IMAGES; NANOTUBES; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON OXIDES; SUBSTRATES; SURFACE POTENTIAL; SURFACES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; EMISSION; FERMIONS; LEPTON BEAMS; LEPTONS; MICROSCOPY; MINERALS; NANOSTRUCTURES; NONMETALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; POTENTIALS; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.