Published December 15, 2013
| Version v1
Journal article
Development of redox glasses and subsequent processing by means of pulsed laser deposition for realizing silicon-based thin-film sensors
Creators
- 1. Institute of Nano- und Biotechnologies, Aachen University of Applied Sciences, Jülich (Germany)
- 2. Kurt-Schwabe-Institut für Mess- und Sensortechnik e.V. Meinsberg, Ziegra-Knobelsdorf (Germany)
- 3. Peter Grünberg Institute, Research Centre Jülich GmbH, Jülich (Germany)
Description
In this work, two different redox-sensitive glass materials have been fabricated for the development of a production friendly redox electrode. The specific glass targets have been prepared by glass pouring process. The transducer structure is fabricated via conventional silicon-based semiconductor technology. The glass bulk material was deposited for the first time by means of pulsed laser deposition process into the thin-film state on the sensor structures. The fabricated sensors have been physically and electrochemically characterized by X-ray photoelectron spectroscopy, determination of expansion coefficient, impedance and potentiometric measurements
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2013.08.092Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2013.08.092;
- PII
- S0013-4686(13)01622-8;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 113
- Journal Page Range
- p. 762-767
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45055425
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- DEPOSITS; ELECTRODES; ENERGY BEAM DEPOSITION; GLASS; LASER RADIATION; POTENTIOMETRY; PULSED IRRADIATION; SEMICONDUCTOR MATERIALS; SENSORS; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHEMICAL ANALYSIS; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; FILMS; IRRADIATION; MATERIALS; PHOTOELECTRON SPECTROSCOPY; QUANTITATIVE CHEMICAL ANALYSIS; RADIATIONS; SPECTROSCOPY; SURFACE COATING; TITRATION; VOLUMETRIC ANALYSIS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.