Chemical deposition of nanostructured tungsten and tungsten-alloy coatings from gas phase

History of the fluoride base method of tungsten low-temperature deposition, of tungsten alloys and compounds in Russia is briefly outlined. Paper deals with the physicochemical bases (thermodynamics, kinetics) of the precipitation process. The most probable path of both homogeneous and heterogeneous reactions resulting in metallic tungsten formation at the base layer surface is substantiated theoretically. On the basis of the experimental investigation into the crystallization initial stages one puts forward a theoretical mechanism of formation of the growth active centres. Paper presents the kinetic characteristics of tunsten coprecipitation with high-melting metals (V, Nb, Ta, Mo, W, Re) and the physicochemical features of coatings. Paper lists data on precipitation of solid carbide-tunsten layers from a gaseous phase under the base layer low temperature. Paper dwells upon the application possible fields of the tungsten base coatings, of coatings based on tungsten alloys with the transition metals and with the carbides