Published October 1, 2010 | Version v1
Journal article

Electrochromic performance of NiVxOy thin films deposited onto flexible PET/ITO substrates by reactive plasma sputtering for flexible electrochromic devices

  • 1. Department of Chemical Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407, Taiwan (China)

Description

An investigation was conducted on the electrochromic properties of plasma sputtered-nickel-vanadium oxide thin films on 40 Ω/□ flexible polyethylene terephthalate/indium tin oxide substrates. Metallic Ni0.93V0.07 target, sputtered by radio frequency power with argon gases and reacted with oxygen gases at room temperature (23 oC), was proven to provide extraordinary electrochromic performance. Cyclic voltammetry switching measurements found that only low driving voltages from - 1 V to 1 V were needed to provide reversible Li+ ion intercalation and deintercalation. The light modulation with up to 52% of transmittance variation, optical density change of 0.446 and color efficiency of 63.8 cm2/C at a wavelength of 550 nm was obtained for 200 cycles of Li+ intercalation and deintercalation in a 1 M LiClO4-propylene carbonate electrolyte.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2010.05.004

Additional details

Identifiers

DOI
10.1016/j.tsf.2010.05.004;
PII
S0040-6090(10)00655-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
518
Journal Issue
24
Journal Page Range
p. 7416-7420
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Taiwan Association for Coatings and Thin Films Technology international thin films conference
Acronym
TACT 2009
Dates
14-16 Dec 2009
Place
Taipei, Taiwan (China)

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.