Published December 2002 | Version v1
Journal article

Aberration characteristics of immersion lenses for LVSEM

Description

This paper investigates the on-axis aberration characteristics of various immersion objective lenses for low voltage scanning electron microscopy (LVSEM). A simple aperture lens model is used to generate smooth axial field distributions. The simulation results show that mixed field electric-magnetic immersion lenses are predicted to have between 1.5 and 2 times smaller aberration limited probe diameters than their pure-field counterparts. At a landing energy of 1 keV, mixed field immersion lenses operating at the vacuum electrical field breakdown limit are predicted to have on-axis aberration coefficients between 50 and 60 μm, yielding an ultimate image resolution of below 1 nm. These aberrations lie in the same range as those for LVSEM systems that employ aberration correctors

Additional details

Identifiers

PII
S0304399102002887;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
93
Journal Issue
3-4
Journal Page Range
p. 331-338
ISSN
0304-3991
CODEN
ULTRD6

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37036586
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
APERTURES; DISTRIBUTION; ELECTRIC FIELDS; ELECTRIC POTENTIAL; IMAGES; KEV RANGE 01-10; LENSES; SCANNING ELECTRON MICROSCOPY; SIMULATION; SPATIAL RESOLUTION
Descriptors DEC
ELECTRON MICROSCOPY; ENERGY RANGE; KEV RANGE; MICROSCOPY; OPENINGS; RESOLUTION

Optional Information

Copyright
Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.