Mapping of GaAs and Si wafers and ion-implanted layers by light-induced scattering and absorption of IR light

The methods of light-induced absorption and diffraction have been used to investigate the uniformity of Si and GaAs wafers and ion-implanted Si. Metastable annealing of defects, lifetime modification by swirl and radiation defects and anomalous depth penetration of ion-implantation-created defects have been demonstrated in Si. The mapping of GaAs wafers has been performed with picosecond and nanosecond light pulses and light absorption mechanisms are discussed. (Author)