Published 1972
| Version v1
Journal article
Study of the X-ray photoelectron spectrum of tungsten-tungsten oxide as a function of thickness of the surface oxide layer
Creators
- 1. Oak Ridge National Lab., Tenn. (USA)
- 2. Tennessee Univ., Knoxville (USA)
Description
no abstract available
Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Electron Spectroscopy and Related Phenomena
- Journal Volume
- 1
- Journal Issue
- 2
- Series
- J. Electron Spectrosc. Relat. Phenom.
- Journal Page Range
- 161-168
- ISSN
- 0368-2048
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 4082224
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ANODIZATION; BINDING ENERGY; ELECTRIC POTENTIAL; ELECTRONIC STRUCTURE; KEV RANGE 01-10; LAYERS; MEAN FREE PATH; PHOTOELECTRIC EMISSION; SURFACES; THICKNESS; TUNGSTEN; TUNGSTEN OXIDES; TUNGSTEN 187; X-RAY SPECTRA
- Descriptors DEC
- BETA DECAY RADIOISOTOPES; BETA-MINUS DECAY RADIOISOTOPES; CHALCOGENIDES; CORROSION PROTECTION; DAYS LIVING RADIOISOTOPES; DEPOSITION; DIMENSIONS; ELECTROCHEMICAL COATING; ELECTROLYSIS; ELECTRON EMISSION; ELEMENTS; EMISSION; ENERGY; ENERGY RANGE; EVEN-ODD NUCLEI; HEAVY NUCLEI; ISOTOPES; KEV RANGE; METALS; NUCLEI; OXIDES; RADIOISOTOPES; SPECTRA; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNGSTEN COMPOUNDS; TUNGSTEN ISOTOPES
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent