Published December 23, 2013
| Version v1
Journal article
p-doping-free InGaN/GaN light-emitting diode driven by three-dimensional hole gas
Creators
- 1. LUMINOUS Centre of Excellence for Semiconductor Lighting and Displays, School of Physical and Mathematical Sciences, Nanyang Technological University, 50 Nanyang Avenue, 639798 Singapore (Singapore)
- 2. LUMINOUS Centre of Excellence for Semiconductor Lighting and Displays, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798 Singapore (Singapore)
- 3. Department of Electronics and Electrical Engineering, South University of Science and Technology of China, Shenzhen, Guangdong 518055 (China)
- 4. Department of Physics, UNAM-Institute of Material Science and Nanotechnology, Bilkent University, Ankara TR-06800 (Turkey)
- 5. Department of Electrical and Electronics, UNAM-Institute of Material Science and Nanotechnology, Bilkent University, Ankara TR-06800 (Turkey)
Description
Here, GaN/AlxGa1-xN heterostructures with a graded AlN composition, completely lacking external p-doping, are designed and grown using metal-organic-chemical-vapour deposition (MOCVD) system to realize three-dimensional hole gas (3DHG). The existence of the 3DHG is confirmed by capacitance-voltage measurements. Based on this design, a p-doping-free InGaN/GaN light-emitting diode (LED) driven by the 3DHG is proposed and grown using MOCVD. The electroluminescence, which is attributed to the radiative recombination of injected electrons and holes in InGaN/GaN quantum wells, is observed from the fabricated p-doping-free devices. These results suggest that the 3DHG can be an alternative hole source for InGaN/GaN LEDs besides common Mg dopants
Additional details
Identifiers
- DOI
- 10.1063/1.4858386;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 103
- Journal Issue
- 26
- Journal Page Range
- p. 263501-263501.5
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45074458
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; CHEMICAL VAPOR DEPOSITION; DOPED MATERIALS; ELECTRIC POTENTIAL; ELECTROLUMINESCENCE; ELECTRONS; GALLIUM NITRIDES; HOLES; LIGHT EMITTING DIODES; ORGANOMETALLIC COMPOUNDS; QUANTUM WELLS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHEMICAL COATING; DEPOSITION; ELEMENTARY PARTICLES; EMISSION; FERMIONS; GALLIUM COMPOUNDS; LEPTONS; LUMINESCENCE; MATERIALS; NANOSTRUCTURES; NITRIDES; NITROGEN COMPOUNDS; ORGANIC COMPOUNDS; PHOTON EMISSION; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SURFACE COATING
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC