Published January 2001 | Version v1
Journal article

Thermal micropressure sensor for pressure monitoring in a minute package

  • 1. Electronics Device Division, Toyota Central Research and Development Laboratories, Incorporated, Nagakute, Aichi 480-1192 (Japan)

Description

A thermal micropressure sensor suitable for pressure measurements in the range from 7x10-3 to 1x105 Pa has been fabricated by forming a titanium (Ti) thin-film resistor on a floating nondoped silica glass membrane, with the sensing area being as small as 60 μmx60 μm. The sensor performance is raised by: (1) increasing the ratio of gaseous thermal conduction in the total thermal conduction by sensor structure design; (2) compensating the effect of ambient-temperature drift by using a reference resistor located close to the sensing element but directly on the silicon substrate; and (3) utilizing an optimized novel constant-bias Wheatstone bridge circuit. By choosing a proper bias voltage, which can be found by simple calculation, the circuit extracts information on gaseous thermal conduction from the directly measurable total heat loss of the heated sensing element. The sensor was enclosed in a metal package with a capacity of about 0.5 ml by projection welding and was successfully applied to monitoring the pressure in the minute space

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
19
Journal Issue
1
Journal Page Range
p. 353-357
ISSN
0734-2101
CODEN
JVTAD6

Optional Information

Notes
(c) 2001 American Vacuum Society.