Published December 1993 | Version v1
Journal article Metadata-only

Determination of the stoichiometry of vanadium nitride films by proton back-scattering

Creators

  • 1. Bhabha Atomic Research Centre, Bombay (India). Analytical Chemistry Div.
  • 2. Bhabha Atomic Research Centre, Bombay (India). Div. of Laser and Plasma Technology
  • 3. Indian Inst. of Tech., Bombay (India)

Description

Vanadium nitride films were grown on stainless steel and silicon, with different nitrogen concentrations by varying the partial pressures of nitrogen in a DC magnetron sputtering set-up. These films were characterized for their composition by proton back-scattering and their micro hardness values were correlated with their N/V ratio. (author) 10 refs.; 2 figs.; 1 tab

Additional details

Publishing Information

Journal Title
Journal of Radioanalytical and Nuclear Chemistry
Journal Volume
174
Journal Issue
2
Journal Page Range
p. 265-270.
ISSN
0236-5731
CODEN
JRNCDM

INIS

Country of Publication
Hungary
Country of Input or Organization
Hungary
INIS RN
25030349
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
BACKSCATTERING; FILMS; MICROHARDNESS; PROTON BEAMS; RADIATION SCATTERING ANALYSIS; SPUTTERING; STOICHIOMETRY; VANADIUM NITRIDES
Descriptors DEC
BEAMS; CHEMICAL ANALYSIS; HARDNESS; MECHANICAL PROPERTIES; NITRIDES; NITROGEN COMPOUNDS; NONDESTRUCTIVE ANALYSIS; NUCLEON BEAMS; PARTICLE BEAMS; PNICTIDES; SCATTERING; TRANSITION ELEMENT COMPOUNDS; VANADIUM COMPOUNDS