Published July 2010 | Version v1
Journal article

Electronic band transformation from indirect gap to direct gap in Si–H compound

  • 1. Center for Low-Dimensional Materials, Micro-Nano Devices and System, Jiangsu Polytechnic University, Changzhou 213164 (China)
  • 2. Center for Micro/Nano Science and Technology, Jiangsu University, Zhenjiang 212013 (China)
  • 3. National Laboratory of Infrared Physics, Shanghai Institute for Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)

Description

The electronic band structures of periodic models for Si–H compounds are investigated by the density functional theory. Our results show that the Si–H compound changes from indirect-gap semiconductor to direct-gap semiconductor with the increase of H content. The density of states, the partial density of states and the atomic charge population are examined in detail to explore the origin of this phenomenon. It is found that the Si–Si bonds are affected by H atoms, which results in the electronic band transformation from indirect gap to direct gap. This is confirmed by the nearest neighbour semi-empirical tight-binding (TB) theory. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/19/7/077103

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
19
Journal Issue
7
Journal Page Range
[6 p.]
ISSN
1674-1056