Electrodeposition and characterization of nano-crystalline antimony telluride thin films
Creators
- 1. Sandia National Laboratories, Livermore, CA 94550 (United States)
- 2. Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA 22904 (United States)
- 3. Sandia National Laboratories, Albuquerque, NM 87185 (United States)
Description
Electrodeposition is a promising low-cost method to fabricate nanostructured thermoelectric thin films such as Sb2Te3. However, electrodeposition of crystalline Sb2Te3 without the need for additional processing and with good compositional control has presented a challenge. Here we report on the electrodeposition of crystalline Sb2Te3 thin films at room temperature from a tartaric–nitric acid electrolyte using a pulsed, potentiostatic process. The effects of synthesis conditions on the resulting microstructure and compositional homogeneity are investigated using x-ray diffraction, electron diffraction, electron microscopy, and energy dispersive x-ray spectroscopy. The composition of the Sb–Te films was found to be dependent on the interval between pulses, a result that is likely due to the slow kinetics associated with Sb2Te3 formation at the surface. We also observed a change in texture and microstructure with varied applied pulse duration: for short pulse durations a lamellar microstructure with a {000ℓ} texture forms, whereas for longer pulse durations a more equiaxed and randomly oriented microstructure forms. The thermal conductivities of the pulsed electrodeposited films are surprisingly low at less than 2 W/K·m and are found to systematically decrease with reduced pulse time. - Highlights: ► We investigate the growth, microstructure, and thermal conductivity of Sb2Te3 films. ► Pulsed electrodeposition is used to grow crystalline Sb2Te3 films. ► Film composition and microstructure depend on the growth conditions. ► Kinetics and thermodynamics are used to explain these observations. ► The low thermal conductivities observed are correlated to microstructure and texture.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2012.05.078Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2012.05.078;
- PII
- S0040-6090(12)00679-7;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 520
- Journal Issue
- 19
- Journal Page Range
- p. 6109-6117
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44103497
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANTIMONY; ANTIMONY TELLURIDES; ELECTRODEPOSITION; ELECTROLYTES; ELECTRON DIFFRACTION; KINETICS; MICROSTRUCTURE; NANOSTRUCTURES; PULSES; SURFACES; SYNTHESIS; TEMPERATURE RANGE 0273-0400 K; THERMAL CONDUCTIVITY; THERMODYNAMICS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
- Descriptors DEC
- ANTIMONY COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; LYSIS; METALS; MICROSCOPY; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; SURFACE COATING; TELLURIDES; TELLURIUM COMPOUNDS; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.