Published September 7, 2009 | Version v1
Journal article

Ion implantation and energy loss effect during high-voltage pulsed glow discharge in a tube

  • 1. State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001 (China)

Description

Plasma parameters of high-voltage pulsed glow discharge in a tube were studied using a static probe and optical emission spectrometry. Experiment results show that two kinds of plasma can be obtained in the tube and a virtual anode can be formed at the center of the tube. The potential of the virtual anode is about 20%-30% of the applied bias. The Auger electron spectroscopy depth profile shows that the peak depth of the implanted ions in the tube is about 70%-80% of that outside the tube, owing to the virtual anode.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
95
Journal Issue
10
Journal Page Range
p. 101501-101501.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41040371
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ANODES; AUGER ELECTRON SPECTROSCOPY; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; ENERGY LOSSES; GLOW DISCHARGES; ION IMPLANTATION; PLASMA; PLASMA PRODUCTION; TUBES
Descriptors DEC
ELECTRIC DISCHARGES; ELECTRODES; ELECTRON SPECTROSCOPY; LOSSES; SPECTROSCOPY

Optional Information

Notes
(c) 2009 American Institute of Physics