Published September 7, 2009
| Version v1
Journal article
Ion implantation and energy loss effect during high-voltage pulsed glow discharge in a tube
- 1. State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001 (China)
Description
Plasma parameters of high-voltage pulsed glow discharge in a tube were studied using a static probe and optical emission spectrometry. Experiment results show that two kinds of plasma can be obtained in the tube and a virtual anode can be formed at the center of the tube. The potential of the virtual anode is about 20%-30% of the applied bias. The Auger electron spectroscopy depth profile shows that the peak depth of the implanted ions in the tube is about 70%-80% of that outside the tube, owing to the virtual anode.
Additional details
Identifiers
- DOI
- 10.1063/1.3225155;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 95
- Journal Issue
- 10
- Journal Page Range
- p. 101501-101501.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41040371
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ANODES; AUGER ELECTRON SPECTROSCOPY; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; ENERGY LOSSES; GLOW DISCHARGES; ION IMPLANTATION; PLASMA; PLASMA PRODUCTION; TUBES
- Descriptors DEC
- ELECTRIC DISCHARGES; ELECTRODES; ELECTRON SPECTROSCOPY; LOSSES; SPECTROSCOPY
Optional Information
- Notes
- (c) 2009 American Institute of Physics