In situ stress measurements during the electrochemical adsorption/desorption of self-assembled monolayers

This paper examines the surface stress associated with the electrochemical desorption of 4-mercaptobenzoic acid (4-MBA) from (1 1 1) textured Au in aqueous 0.1 mol L^-1 KOH. Self-assembled monolayers of varying coverage were adsorbed onto the Au electrode surface from a 0.1 mol L^-1 aqueous KOH solution containing 1 mmol L^-1 4-MBA. Adsorption follows Langmuir kinetics and fully formed monolayers, corresponding to 0.29 coverage with respect to the Au surface, are formed in about 120 min. XP spectra confirm the formation of the Au-S bond while FTIR spectra indicate that the 4-MBA is orientated with the carboxylate pointed away from the surface. The one-electron reductive desorption of 4-MBA occurs at a potential of -0.9 to -1.0 V vs. SSE, depending on coverage, and causes a surface stress change in the tensile direction, indicating that 4-MBA adsorption induces a compressive surface stress to the Au. At short immersion times and low monolayer coverage, the surface stress increases with coverage as the stress response is primarily governed by the Au-S bond density. SAM desorption following longer immersion times produces large stress changes with little corresponding change in SAM coverage. We attribute the additional compressive stress to stabilization of the Au-S bonding regions and the coulombic repulsion between neighboring molecules, both associated with ordering of the 4-MBA on the Au surface