Published 1984 | Version v1
Book

Electron beam curing of acrylic oligomers

  • 1. Sony Corporation Research Center, Hodogaya-ku, Yokohama

Description

The electron-beam curing process of acrylic oligomers, with and without γ-Fe2O3 pigment filler and blended linear polymer, was investigated in terms of molecular structure and reaction mechanism. The polymerized fraction of trimethylolpropane-triacrylate (TMPTA) oligomers increases with increasing total dose, and is independent of the dose rate. Since the reaction rate is linearly dependent on the dose rate, the reaction mechanism involves monomolecular termination. The reaction rate does not depend on the number of functional groups of the oligomer at low doses, but above 0.3 Mrad the rate is slower for oligomers of higher functionality. A gel is formed more readily upon curing of a polyfunctional than a monofunctional oligomer, especially at high conversion to polymer; the resulting loss of flexibility of the polymer chains slows the reaction. Decrease of the molecular weight per functional group results in lower conversion; this is also due to the loss of chain flexibility, which is indicated as well by a higher glass-transition temperature. Modification of the acrylate oligomers with urethane results in more effective cross-linking reactions because of the more rigid molecular chains. Addition of γ-Fe2O3 pigment reduces the reaction rate very little, but has the effect of providing added structural integrity, as indicated by the decrease of solvent-extractable material and the improvement of anti-abrasion properties. However, the flexibility of the coating and its adhesion to a PET base film are diminished. To increase the flexibility, linear polyvinylchloride and/or polyurethane were added to the acrylic oligomers. Final conversion to polymer was nearly 100 percent, and a higher elastic modulus and better antiabrasion properties were realized

Additional details

Publishing Information

Publisher
Pergamon Press.
Imprint Place
Elmsford, NY (USA)
Imprint Title
Progress in radiation processing. Vol. 2
Journal Page Range
p. 567-579.

Conference

Title
5. international meeting on radiation processing.
Dates
21-26 Oct 1984.
Place
San Diego, CA (USA).