Published August 31, 2017 | Version v1
Journal article

Study of copper-phthalocyanine and pentacene film growth on transferred graphene: The influence of polymer residues

Description

Wet transferring of chemical vapor deposition (CVD) graphene with the assistance of poly(methyl methacrylate) (PMMA) usually leaves polymer contaminations onto graphene surface. Knowledge about the influence of PMMA residues on organic film growth properties is crucial for graphene-related organic electronic devices. In this study, we investigate growth properties of coper-phthalocyanine (CuPc) and pentacene on PMMA contaminated graphene substrate. Grain size and morphologies of CuPc and pentacene films were found to be governed by the density of PMMA residues on graphene. Nevertheless, the molecular packing structures of CuPc and pentacene respond differently with the density with PMMA residues. CuPc molecules tend to nucleated into grains with molecular π-π stacking parallel to graphene surface, which is irrespective of the PMMA residues. Whereas the packing behavior of pentacene on PMMA-transferred CVD graphene is sensitive to the density of PMMA residues. Molecular π-π stacking perpendicular to graphene is observed when pentacene was deposited onto as-transferred graphene. Parallel mode was observed only on the substrates without PMMA residues. - Highlights: • Nonnucleated polymer residues (PR) governed the growth of organic films on graphene. • Higher temperature is needed to remove nonnucleated PR than the nucleated ones. • Unlike pentacene, packing mode of CuPc is irrespective to the PR on graphene.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2017.07.028

Additional details

Identifiers

DOI
10.1016/j.tsf.2017.07.028;
PII
S0040-6090(17)30522-9;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
636
Journal Page Range
p. 723-729
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.