Relationship of Fe2+ concentration in solution and current efficiency in electrodeposition of CoFe films
- 1. Research and Development, Seagate Technology, Bloomington, MN 55435 (United States)
Description
Our published work on stress evolution in CoFe films [Electrochim. Acta 55 (2010) 9035], indicated that adsorption/desorption of hydrogen is a primary cause of tensile stress which increases with the increase of Fe-content in deposit and decrease of current efficiency, i.e. higher supply of protons to the electrode surface. Using the electroanalytical techniques in this study it has been demonstrated that a higher supply of protons to the electrode surface with increase of Fe2+ concentrations in solution brings about higher Fe-content in deposit and lower current efficiency. First, it was found that the reduction rate of H+ from the solution is faster on CoFe surface with higher Fe-content in CoFe deposit. Second, it was found that higher concentrations of Fe2+ in solution bring about higher surface concentration of H+ through the Fe2+ hydrolysis reaction, i.e. Fe2+ + HOH = FeOH+ + H+. The proton liberated through hydrolysis reaction is reduced as soon as it is formed, together with other electroactive species.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2011.08.066Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2011.08.066;
- PII
- S0013-4686(11)01311-9;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 58
- Journal Page Range
- p. 25-32
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43093113
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ADSORPTION; DEPOSITS; DESORPTION; EFFICIENCY; ELECTRODEPOSITION; FILMS; HYDROLYSIS; SURFACES
- Descriptors DEC
- CHEMICAL REACTIONS; DECOMPOSITION; DEPOSITION; ELECTROLYSIS; LYSIS; SOLVOLYSIS; SORPTION; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.