Structure and morphology of magnetron sputtered W films studied by x-ray methods
- 1. Institute of Physics, Bijenička 46, HR-10000 Zagreb (Croatia)
- 2. Rudjer Bošković Institute, Bijenička cesta 54, HR-10000 Zagreb (Croatia)
- 3. Elettra-Sincrotrone Trieste, I-34149 Basovizza (Italy)
Description
The structural and morphological studies of a number of tungsten (W) thin films were carried out using grazing incidence x-ray diffraction, x-ray reflectivity and grazing incidence small-angle x-ray scattering. The W films were prepared by magnetron sputtering in an Ar atmosphere at various pressures and with different powers applied to the W target. We find films with metastable β-W or amorphous phase in the form of nano-columns when deposited at high Ar pressure (>5 mTorr) or with low sputtering power (<20 W), respectively. The appearance of the metastable β-W phase is related to the lowered deposition flux of W atoms, increased film porosity and correspondingly to the higher probability of oxygen incorporation. In films with only the β-W phase we find up to 50% reduction in mass density compared with the density of bulk tungsten. The nanoporosity of the W films is discussed in terms of self-shadowing effects. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/46/9/095304Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 46
- Journal Issue
- 9
- Journal Page Range
- [10 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44071901
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATMOSPHERES; ATOMS; DENSITY; DEPOSITION; MAGNETRONS; MASS; OXYGEN; REDUCTION; REFLECTIVITY; SMALL ANGLE SCATTERING; SPUTTERING; THIN FILMS; TUNGSTEN; X RADIATION; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; IONIZING RADIATIONS; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; REFRACTORY METALS; SCATTERING; SURFACE PROPERTIES; TRANSITION ELEMENTS