Published August 13, 2008 | Version v1
Journal article

The growth and morphology of epitaxial multilayer graphene

  • 1. The Georgia Institute of Technology, Atlanta, GA 30332-0430 (United States)

Description

The electronic properties of epitaxial graphene grown on SiC have shown its potential as a viable candidate for post-CMOS electronics. However, progress in this field requires a detailed understanding of both the structure and growth of epitaxial graphene. To that end, this review will focus on the current state of epitaxial graphene research as it relates to the structure of graphene grown on SiC. We pay particular attention to the similarity and differences between graphene growth on the two polar faces, (0001) and (0001-bar), of hexagonal SiC. Growth techniques, subsequent morphology and the structure of the graphene/SiC interface and graphene stacking order are reviewed and discussed. Where possible the relationship between film morphology and electronic properties will also be reviewed. (topical review)

Availability note (English)

Available from http://dx.doi.org/10.1088/0953-8984/20/32/323202

Additional details

Identifiers

DOI
10.1088/0953-8984/20/32/323202;
PII
S0953-8984(08)55594-9;

Publishing Information

Journal Title
Journal of Physics. Condensed Matter
Journal Volume
20
Journal Issue
32
Journal Page Range
[27 p.]
ISSN
0953-8984
CODEN
JCOMEL

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40033310
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTAL GROWTH; CURIUM OXIDES; EPITAXY; FILMS; INTERFACES; LAYERS; POTENTIALS; SILICON CARBIDES
Descriptors DEC
ACTINIDE COMPOUNDS; CARBIDES; CARBON COMPOUNDS; CHALCOGENIDES; CRYSTAL GROWTH METHODS; CURIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; TRANSPLUTONIUM COMPOUNDS; TRANSURANIUM COMPOUNDS