Published April 1, 2018 | Version v1
Journal article

Scalability of dark current in silicon PIN photodiode

  • 1. School of Electronic Engineering, State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing Key Laboratory of Work Safety Intelligent Monitoring, Beijing 100876 (China)
  • 2. Department of Information, Beijing University of Technology, Beijing 100124 (China)

Description

The mechanism for electrical conduction is investigated by the dark temperature-dependent current–voltage characteristics of Si PIN photodiodes with different photosensitive areas. The characteristic tunneling energy E 00 can be obtained to be 1.40 meV, 1.53 meV, 1.74 meV, 1.87 meV, and 2.01 meV, respectively, for the photodiodes with L = 0.25 mm, 0.5 mm, 1 mm, 1.5 mm, and 2 mm by fitting the ideality factor n versus temperature curves according to the tunneling-enhanced recombination mechanism. The trap-assisted tunneling-enhanced recombination in the i-layer plays an important role in our device, which is consistent with the experimental result that area-dependent leakage current is dominant with the side length larger than 1 mm of the photosensitive area. Our results reveal that the quality of the bulk material plays an important role in the electrical conduction mechanism of the devices with the side length larger than 1 mm of the photosensitive area. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/27/4/048501

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
27
Journal Issue
4
Journal Page Range
[3 p.]
ISSN
1674-1056