Published May 7, 2015 | Version v1
Journal article

Ferromagnetism of magnetically doped topological insulators in CrxBi2−xTe3 thin films

  • 1. Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011 (United States)
  • 2. Ames Laboratory, U.S. Department of Energy, Ames, Iowa 50011 (United States)

Description

We investigated the effect of magnetic doping on magnetic and transport properties of Bi2Te3 thin films. CrxBi2−xTe3 thin films with x = 0.03, 0.14, and 0.29 were grown epitaxially on mica substrate with low surface roughness (∼0.4 nm). It is found that Cr is an electron acceptor in Bi2Te3 and increases the magnetization of CrxBi2−xTe3. When x = 0.14 and 0.29, ferromagnetism appears in CrxBi2−xTe3 thin films, where anomalous Hall effect and weak localization of magnetoconductance were observed. The Curie temperature, coercivity, and remnant Hall resistance of thin films increase with increasing Cr concentration. The Arrott-Noakes plot demonstrates that the critical mechanism of the ferromagnetism can be described better with 3D-Heisenberg model than with mean field model. Our work may benefit for the practical applications of magnetic topological insulators in spintronics and magnetoelectric devices

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
117
Journal Issue
17
Journal Page Range
vp.
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

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