Large area coating with TiC by a plasma CVD method

A three-dimensional plasma chemical vapor deposition (TP-CVD) method, which was developed recentrly, was discussed comparing with conventional PVD and CVD. The TP-CVD method was applied to deposit a TiC coating on a molybdenum first wall material of JT-60. As a result, it was found that the material of complicated three-demensional shape was desirably coated by TiC without recrystallization. Thickness of the TiC coating on areas exposed and unexposed by plasma was 20+-5 μm and 5 μm, respectively. Chemical composition, crystal structure and chemical bond characteristics of the coating were actually identical with those obtained by conventional methods. Adherence to the substrate was also quite good. (Kubozono, M.)