Gas effect on the emission and detection of the backscattered electrons in a VP-SEM at low energy
- 1. L2MSM Laboratory, Physics Department, Faculty of Exact Sciences, Djilali Liabes University BP.89 Sidi Bel-Abbes 22000 (Algeria)
- 2. IMT Lille Douai, Université Lille, Cité Scientifique Rue Guglielmo Marconi BP 20145 59653 Villeneuve D'ascq (France)
- 3. Univ-Lille Nord de France Université d'Artois - Faculté Jean Perrin – SP 18 62307 Lens cedex (France)
Description
Highlights: • Increasing pressure makes backscattering coefficient to increase at specimen top surface and decrease at the detector. • Increasing pressure makes the BSE exit zone to extend at the specimen top surface. • At 5 kV accelerating voltage and up to 1000 Pa, no effect is found under helium. • A new approach is proposed to determine the operating pressure range for the best resolution. - Abstract: The effect of the electron beam skirting on the emission and detection of the backscattered electrons (BSE) in a low vacuum scanning electron microscope is investigated at low energy regime. Monte Carlo computed dependencies of the BSE distribution on the water vapor and air pressure shown a significant increase of the extent of the BSE exit zone. The pressure variation has however a little effect when helium gas is used. A new approach based on the comparison between the sizes of the skirt and the BSE exit zone on the specimen surface provides a useful tool to determine the operating pressure range that ensures minimal degradation of the lateral resolution in BSE imaging mode.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.ultramic.2017.08.002Additional details
Identifiers
- DOI
- 10.1016/j.ultramic.2017.08.002;
- PII
- S0304399117303091;
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 184
- Journal Issue
- Part A
- Journal Page Range
- p. 17-23
- ISSN
- 0304-3991
- CODEN
- ULTRD6
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50052159
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- BACKSCATTERING; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRONS; RESOLUTION; SCANNING ELECTRON MICROSCOPY; WATER VAPOR
- Descriptors DEC
- BEAMS; ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; FERMIONS; FLUIDS; GASES; LEPTON BEAMS; LEPTONS; MICROSCOPY; PARTICLE BEAMS; SCATTERING; VAPORS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.