Published September 14, 2015 | Version v1
Journal article

Combining density functional and incremental post-Hartree-Fock approaches for van der Waals dominated adsorbate-surface interactions: Ag2/graphene

  • 1. Instituto de Física Fundamental (C.S.I.C.), Serrano 123, E-28006 Madrid (Spain)
  • 2. Université Paris-Est, Laboratoire Modélisation et Simulation Multi Echelle, MSME UMR 8208 CNRS, 5 bd Descartes, 77454 Marne-la-Vallée (France)
  • 3. Institut für Theoretische Chemie, Universität Stuttgart, D-70550 Stuttgart (Germany)

Description

A combined density functional (DFT) and incremental post-Hartree-Fock (post-HF) approach, proven earlier to calculate He-surface potential energy surfaces [de Lara-Castells et al., J. Chem. Phys. 141, 151102 (2014)], is applied to describe the van der Waals dominated Ag2/graphene interaction. It extends the dispersionless density functional theory developed by Pernal et al. [Phys. Rev. Lett. 103, 263201 (2009)] by including periodic boundary conditions while the dispersion is parametrized via the method of increments [H. Stoll, J. Chem. Phys. 97, 8449 (1992)]. Starting with the elementary cluster unit of the target surface (benzene), continuing through the realistic cluster model (coronene), and ending with the periodic model of the extended system, modern ab initio methodologies for intermolecular interactions as well as state-of-the-art van der Waals-corrected density functional-based approaches are put together both to assess the accuracy of the composite scheme and to better characterize the Ag2/graphene interaction. The present work illustrates how the combination of DFT and post-HF perspectives may be efficient to design simple and reliable ab initio-based schemes in extended systems for surface science applications

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Chemical Physics
Journal Volume
143
Journal Issue
10
Journal Page Range
p. 102804-102804.15
ISSN
0021-9606
CODEN
JCPSA6

Optional Information

Notes
(c) 2015 AIP Publishing LLC