Published March 1, 2005 | Version v1
Journal article

Correlation between particle removal and shock-wave dynamics in the laser shock cleaning process

  • 1. Laser Engineering Group, IMT Co. Ltd., 449-860 (Korea, Republic of)
  • 2. Department of Mechanical Engineering, POSTECH, Pohang, 790-784 (Korea, Republic of)

Description

It has been shown that the laser shock cleaning (LSC) method is effective for eliminating micron- and submicron-scale particulates from solid surfaces. In the LSC process, a high-power laser pulse induces optical breakdown of the ambient gas close to the solid surface to be cleaned and the subsequently-created shock wave followed by a high-speed flow stream detaches the particles. Therefore, there should be a strong correlation between the dynamics of the shock wave and the cleaning performance. In this work, experimental analyses are conducted to measure the cleaning performance using micron-sized alumina particles attached to a silicon surface. The experimental data showing the particle-removal performance are compared with the results of the dynamics of the laser-induced shock waves, leading to a simple model for particle removal by the LSC scheme in the continuum-flow regime

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
97
Journal Issue
5
Journal Page Range
p. 054903-054903.6
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36106932
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ALUMINIUM OXIDES; CORRELATIONS; EXPERIMENTAL DATA; KNUDSEN FLOW; PARTICLE SIZE; PARTICULATES; PERFORMANCE; PULSES; SHOCK WAVES; SILICON; SOLIDS; SURFACE CLEANING
Descriptors DEC
ALUMINIUM COMPOUNDS; CHALCOGENIDES; CLEANING; DATA; ELEMENTS; FLUID FLOW; GAS FLOW; INFORMATION; NUMERICAL DATA; OXIDES; OXYGEN COMPOUNDS; PARTICLES; SEMIMETALS; SIZE; SURFACE FINISHING

Optional Information

Notes
(c) 2005 American Institute of Physics