Published October 3, 2011
| Version v1
Journal article
Fabrication of Fe3Si/CaF2 heterostructures ferromagnetic resonant tunneling diode by selected-area molecular beam epitaxy
Creators
- 1. Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573 (Japan)
- 2. Nanodevice Innovation Research Center and Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568 (Japan)
Description
We have fabricated 200-nm-diameter ferromagnetic resonant tunneling diodes (FM-RTDs) using CaF2/Fe3Si heterostructures on Si(111) substrates, by selected-area molecular beam epitaxy (MBE) using electron-beam (EB) lithography. Clear negative differential resistances (NDRs) were observed in the current-voltage (I-V) characteristics at room temperature (RT). The reproducibility of the I-V characteristics was greatly improved, and approximately 40% of the FM-RTDs showed clear NDRs at RT.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2011.05.026Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2011.05.026;
- PII
- S0040-6090(11)01158-8;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 519
- Journal Issue
- 24
- Journal Page Range
- p. 8509-8511
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Asia-Pacific conference on semiconducting silicides science and technology towards sustainable optoelectronics
- Acronym
- APAC-SILICIDE 2010
- Dates
- 24-26 Jul 2010
- Place
- Tsukuba (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43052275
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CALCIUM FLUORIDES; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; FABRICATION; IRON SILICIDES; MOLECULAR BEAM EPITAXY; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; TUNNEL DIODES
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; BEAMS; CALCIUM COMPOUNDS; CALCIUM HALIDES; CRYSTAL GROWTH METHODS; ELECTRICAL PROPERTIES; EPITAXY; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; IRON COMPOUNDS; LEPTON BEAMS; PARTICLE BEAMS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SILICIDES; SILICON COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.