Indigenous development of cold atmospheric pressure plasma device for multipurpose applications
- 1. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, Trombay – 400085 (India)
- 2. Homi Bhabha National Institute, Anushaktinagar, Mumbai-400094 (India)
Description
Cold atmospheric pressure plasma (CAPP) technology is gaining attention for/due to its low cost, simplicity, and ability to create active species. It shows promise for coating, etching, surface treatment and medical applications. In the present study, we have used an indigenously designed 10 MHz atmospheric pressure plasma jet based on Tesla coil principle. The designed device was then applied for the chemical etching as well as bacterial inactivation to show its multipurpose efficacy. Our observations revealed that the device can manage complex molecular plasma gases such as CF4 and O2. Effective bactericidal effects can be achieved with the device operating at power levels as low as approximately 20 watts, while efficient etching can be obtained when the device operates at around 80 watts of power. (author)
Additional details
Publishing Information
- Journal Title
- BARC Newsletter
- Journal Issue
- March-April 2024 Issue
- Journal Page Range
- p. 19-22
- ISSN
- 0976-2108
INIS
- Country of Publication
- India
- Country of Input or Organization
- India
- INIS RN
- 55048176
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- CLOSED PLASMA DEVICES; COLD PLASMA; ETCHING; PLASMA ARC SPRAYING; PLASMA INSTABILITY
- Descriptors DEC
- DEPOSITION; INSTABILITY; PLASMA; PLASMA TECHNOLOGY; SPRAY COATING; SURFACE COATING; SURFACE FINISHING; THERMONUCLEAR DEVICES