Published March 1994
| Version v1
Journal article
Application of fundamental parameter technique to XRF thickness gauge
- 1. Seiko Instruments Inc., Tokyo (Japan)
Description
Fundamental parameter method is applied to XRF plating thickness gauge which utilize a proportional counter as an energy dispersive detector. Correction methods such as background subtraction, peak deconvolution and utilization of secondary filter are developed to derive pure fluorescent X-ray intensities of elements from poor energy resolution spectrum. Several alloy and multilayer platings such as Sn-Pb/Ni/Ag/ceramics, Sn-Pb/Ni/Cu and Zn-Ni/Fe, which are difficult to measure with conventional calibration curve method, are measured with this method successfully with practically acceptable precision. (author)
Additional details
Publishing Information
- Journal Title
- X-sen Bunseki No Shinpo
- Journal Issue
- no.25
- Journal Page Range
- p. 185-194.
- ISSN
- 0911-7806
- CODEN
- XBNSDA
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 27000033
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ALLOYS; PARAMETRIC ANALYSIS; PLATING; THICKNESS GAGES; X-RAY FLUORESCENCE ANALYSIS
- Descriptors DEC
- CHEMICAL ANALYSIS; DEPOSITION; MEASURING INSTRUMENTS; NONDESTRUCTIVE ANALYSIS; SURFACE COATING; X-RAY EMISSION ANALYSIS