Influence of tantalum on mechanical, ferroelectric and dielectric properties of Bi-excess Bi3.25La0.75Ti3O12 thin film
Creators
- 1. National Key Laboratory of Science and Technology on Materials under Shock and Impact, Beijing 10081 (China)
- 2. School of Materials Science and Engineering, Beijing Institute of Technology, Beijing 10081 (China)
- 3. School of Environment and Materials Engineering, Yantai University, Yantai 264005 (China)
Description
The Bi-excess Bi3.25La0.75Ti3O12 (BLT) and Bi3.25La0.75Ti2.91Ta0.09O12 (BLTT) thin films were deposited on Pt(1 1 1)/Ti/SiO2/Si substrates using rf-magnetron sputtering method. The effect of tantalum on mechanical, ferroelectric and dielectric properties of BLT thin films was investigated. XRD patterns reveal that BLT and BLTT thin films have a same second crystalline phase Bi12TiO20, but the former has a randomly oriented major Bi4Ti3O12 phase while the major phase in the later is preferentially oriented along 1 1 7 direction. XPS analysis shows that the substitution of Ta5+ has a significant influence on Ti3+ defects. Mechanical response of thin films is discussed in the light of nano indentation analysis which shows that both the hardness and modulus are reduced with the addition of Ta5+. Ferroelectric properties were improved significantly by Ta5+ doping due to the reduction of Ti3+ defects, and an enhanced remnant polarization (2Pr) of 32.5 μC/cm2 and a decreased coercive field (2Ec) of 260 kV/cm were obtained. In addition, the Ta substitution elevated the dielectric constant and slightly raised the Curie temperature.
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2018.09.040;
- PII
- S0169433218324565;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 463
- Journal Page Range
- p. 1141-1147
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55041884
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CURIE POINT; DEFECTS; DIELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; HARDNESS; MAGNETRONS; POLARIZATION; RANDOMNESS; SILICA; SILICON OXIDES; SUBSTRATES; TANTALUM; TANTALUM IONS; THIN FILMS; TITANIUM IONS; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIELECTRIC MATERIALS; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; IONS; MATERIALS; MECHANICAL PROPERTIES; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; REFRACTORY METALS; SCATTERING; SILICON COMPOUNDS; SPECTROSCOPY; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENTS; TRANSITION TEMPERATURE
Optional Information
- Copyright
- Copyright (c) 2018 Elsevier B.V. All rights reserved.