Published May 15, 2000 | Version v1
Journal article

Nitrogen-induced levels in GaAs1-xNx studied with resonant Raman scattering

  • 1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)

Description

Resonant Raman scattering is used to study the nature of the recently discovered nitrogen-induced level E+ located in the conduction band of GaAs1-xNx (0.001≤x≤0.022). Our data demonstrate that the E+ state is derived from the nitrogen-induced Γ-L mixing of the bulk GaAs states and that it is not an isolated nitrogen impurity level. A broadening of the GaAs-like longitudinal-optical phonon line and an enhancement of the transverse-optical phonon line is observed near resonance, which is interpreted as being due to resonance with strongly localized states. (c) 2000 The American Physical Society

Additional details

Publishing Information

Journal Title
Physical Review. B, Condensed Matter and Materials Physics
Journal Volume
61
Journal Issue
20
Journal Page Range
p. 13687-13690
ISSN
1098-0121

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
32060205
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ELECTRONIC STRUCTURE; EXPERIMENTAL DATA; GALLIUM ARSENIDES; GALLIUM NITRIDES; IMPURITIES; NITROGEN; RAMAN SPECTRA
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; DATA; ELEMENTS; GALLIUM COMPOUNDS; INFORMATION; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; NUMERICAL DATA; PNICTIDES; SPECTRA
Proposed descriptors and Free-text terms
gallium arsenide; III-V semiconductors; wide band gap semiconductors; impurity states; localised states