Published October 31, 2005
| Version v1
Journal article
Thin film deposition on powder surfaces using atmospheric pressure discharge
Creators
- 1. Institute for Low Temperature Plasma Physics, F.-L.-Jahn-Str.19, 17489 Greifswald (Germany)
Description
The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases
Additional details
Identifiers
- DOI
- 10.1063/1.2134635;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 799
- Journal Issue
- 1
- Journal Page Range
- p. 343-346
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 4. international conference on the physics of dusty plasmas
- Dates
- 13-17 Jun 2005
- Place
- Orleans (France)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37038229
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; ATMOSPHERIC PRESSURE; CARBON; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; MIXTURES; OXYGEN; OXYGEN COMPOUNDS; PARTICLES; PLASMA; POTASSIUM BROMIDES; POWDERS; PRECURSOR; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SODIUM CHLORIDES; SURFACES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALKALI METAL COMPOUNDS; BROMIDES; BROMINE COMPOUNDS; CHLORIDES; CHLORINE COMPOUNDS; DISPERSIONS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; FLUIDS; GASES; HALIDES; HALOGEN COMPOUNDS; MATERIALS; MICROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; POTASSIUM COMPOUNDS; RARE GASES; SODIUM COMPOUNDS; SPECTROSCOPY
Optional Information
- Notes
- (c) 2005 American Institute of Physics