Published October 31, 2005 | Version v1
Journal article

Thin film deposition on powder surfaces using atmospheric pressure discharge

  • 1. Institute for Low Temperature Plasma Physics, F.-L.-Jahn-Str.19, 17489 Greifswald (Germany)

Description

The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
799
Journal Issue
1
Journal Page Range
p. 343-346
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
4. international conference on the physics of dusty plasmas
Dates
13-17 Jun 2005
Place
Orleans (France)

Optional Information

Notes
(c) 2005 American Institute of Physics