Published November 1, 2010 | Version v1
Journal article

What is the origin of tail states in amorphous semiconductors?

Creators

  • 1. Department of Theoretical Physics, Budapest University of Technology and Economics, H-1521 Budapest Pf. 91, Hungary and Joint Research Center for High-Technology, Tokyo Polytechnic University, 164-8678 Tokyo (Japan)

Description

The tight-binding molecular dynamics simulations and reverse Monte Carlo structural modeling method were applied in order to investigate the existence of small bond angles (like those in triangles and squares) in amorphous silicon networks. The influence of small bond angles on the electronic density of states was analyzed. The presence of a number of smaller bond angles is necessary for a proper reproduction of the neutron diffraction data of amorphous silicon. Semi-empirical Hartree-Fock calculations show that these arrangements provide higher energy states in electronic density of states which are localized on these local structures. We consider that smaller bond angles are a new type of defects. These defect states are highly energetic and they are the origin of tail in amorphous semiconductors.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/253/1/012013

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
253
Journal Issue
1
Journal Page Range
[5 p.]
ISSN
1742-6596

Conference

Title
16. international school on condensed matter physics - Progress in solid state and molecular electronics, ionics and photonics
Acronym
16 ISCMP
Dates
29 Aug - 3 Sep 2010
Place
Varna (Bulgaria)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42053627
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AMORPHOUS STATE; BOND ANGLE; DENSITY; HARTREE-FOCK METHOD; MOLECULAR DYNAMICS METHOD; MONTE CARLO METHOD; NEUTRON DIFFRACTION; POINT DEFECTS; SEMICONDUCTOR MATERIALS; SILICON; SIMULATION
Descriptors DEC
APPROXIMATIONS; CALCULATION METHODS; COHERENT SCATTERING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DIFFRACTION; ELEMENTS; MATERIALS; PHYSICAL PROPERTIES; SCATTERING; SEMIMETALS